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Abstract
Interface engineering is a proven strategy to improve the efficiency of thin film semiconductor based solar energy conversion devices. Ta3N5 thin film photoanode is a promising candidate for photoelectrochemical (PEC) water splitting. Yet, a concerted effort to engineer both the bottom and top interfaces of Ta3N5 thin film photoanode is still lacking. Here, we employ n-type In:GaN and p-type Mg:GaN to modify the bottom and top interfaces of Ta3N5 thin film photoanode, respectively. The obtained In:GaN/Ta3N5/Mg:GaN heterojunction photoanode shows enhanced bulk carrier separation capability and better injection efficiency at photoanode/electrolyte interface, which lead to a record-high applied bias photon-to-current efficiency of 3.46% for Ta3N5-based photoanode. Furthermore, the roles of the In:GaN and Mg:GaN layers are distinguished through mechanistic studies. While the In:GaN layer contributes mainly to the enhanced bulk charge separation efficiency, the Mg:GaN layer improves the surface charge inject efficiency. This work demonstrates the crucial role of proper interface engineering for thin film-based photoanode in achieving efficient PEC water splitting.
Solar-to-fuel energy conversion requires well-designed materials properties to ensure favorable charge carrier movement. Here, authors employ interface engineering of Ta3N5 thin film to enhance bulk carrier separation and interface carrier injection to improve the water-splitting efficiency.
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1 University of Electronic Science and Technology of China, Institute of Fundamental and Frontier Sciences, Chengdu, China (GRID:grid.54549.39) (ISNI:0000 0004 0369 4060)
2 University of Electronic Science and Technology of China, Institute of Fundamental and Frontier Sciences, Chengdu, China (GRID:grid.54549.39) (ISNI:0000 0004 0369 4060); University of Electronic Science and Technology of China, Yangtza Delta Region Institute (Huzhou), Huzhou, China (GRID:grid.54549.39) (ISNI:0000 0004 0369 4060)
3 The University of Tokyo, Institute of Engineering Innovation, Tokyo, Japan (GRID:grid.26999.3d) (ISNI:0000 0001 2151 536X)
4 CoreTech Integrated Limited, PHI China Analytical Laboratory, Nanjing, China (GRID:grid.26999.3d)
5 The University of Tokyo, Office of University Professors, Tokyo, Japan (GRID:grid.26999.3d) (ISNI:0000 0001 2151 536X); Shinshu University, Research Initiative for Supra-Materials (RISM), Nagano, Japan (GRID:grid.263518.b) (ISNI:0000 0001 1507 4692)