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Abstract
Light-emitting electronic devices are ubiquitous in key areas of current technology, such as data communications, solid-state lighting, displays, and optical interconnects. Controlling the spectrum of the emitted light electrically, by simply acting on the device bias conditions, is an important goal with potential technological repercussions. However, identifying a material platform enabling broad electrical tuning of the spectrum of electroluminescent devices remains challenging. Here, we propose light-emitting field-effect transistors based on van der Waals interfaces of atomically thin semiconductors as a promising class of devices to achieve this goal. We demonstrate that large spectral changes in room-temperature electroluminescence can be controlled both at the device assembly stage –by suitably selecting the material forming the interfaces– and on-chip, by changing the bias to modify the device operation point. Even though the precise relation between device bias and kinetics of the radiative transitions remains to be understood, our experiments show that the physical mechanism responsible for light emission is robust, making these devices compatible with simple large areas device production methods.
Here, the authors report the realization of light-emitting field-effect transistors based on van der Waals heterostructures with conduction and valence band edges at the Γ-point of the Brillouin zone, showing electrically tunable and material-dependent electroluminescence spectra at room temperature.
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1 University of Geneva, Department of Quantum Matter Physics, Geneva, Switzerland (GRID:grid.8591.5) (ISNI:0000 0001 2322 4988); University of Geneva, Department of Applied Physics, Geneva, Switzerland (GRID:grid.8591.5) (ISNI:0000 0001 2322 4988)
2 National High Magnetic Field Laboratory, Tallahassee, USA (GRID:grid.481548.4) (ISNI:0000 0001 2292 2549); Florida State University, Department of Physics, Tallahassee, USA (GRID:grid.255986.5) (ISNI:0000 0004 0472 0419)
3 The Ohio State University, Department of Physics, Columbus, USA (GRID:grid.261331.4) (ISNI:0000 0001 2285 7943)
4 Research Center for Functional Materials, National Institute for Materials Science, Tsukuba, Japan (GRID:grid.21941.3f) (ISNI:0000 0001 0789 6880)
5 International Center for Materials Nanoarchitectonics, National Institute for Materials Science, Tsukuba, Japan (GRID:grid.21941.3f) (ISNI:0000 0001 0789 6880)
6 National Graphene Institute, University of Manchester, Manchester, UK (GRID:grid.5379.8) (ISNI:0000000121662407); Henry Royce Institute for Advanced Materials, Manchester, UK (GRID:grid.500282.d)