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Abstract
The trade-off between light absorption and carrier transport in semiconductor thin film photoelectrodes is a major limiting factor of their solar-to-hydrogen efficiency for photoelectrochemical water splitting. Herein, we develop a heterogeneous doping strategy that combines surface doping with bulk gradient doping to decouple light absorption and carrier transport in a thin film photoelectrode. Taking La and Mg doped Ta3N5 thin film photoanode as an example, enhanced light absorption is achieved by surface La doping through alleviating anisotropic optical absorption, while efficient carrier transport in the bulk is maintained by the gradient band structure induced by gradient Mg doping. Moreover, the homojunction formed between the La-doped layer and the gradient Mg-doped layer further promotes charge separation. As a result, the heterogeneously doped photoanode yields a half-cell solar-to-hydrogen conversion efficiency of 4.07%, which establishes Ta3N5 as a leading performer among visible‐light‐responsive photoanodes. The heterogeneous doping strategy could be extended to other semiconductor thin film light absorbers to break performance trade-offs by decoupling light absorption and carrier transport.
While photoelectrochemical water splitting offers a promising means to obtain renewable H2, it is challenging to balance light absorption and carrier transport in semiconductor thin films. Here, authors combine surface doping and bulk gradient doping to decouple these factors to boost performances.
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Details
; Li, Qiaoqiao 3
; Zhou, Liujiang 3
; Wang, Qian 4
; Li, Changli 5
; Shibata, Naoya 2
; Domen, Kazunari 6
; Li, Yanbo 1
1 University of Electronic Science and Technology of China, Institute of Fundamental and Frontier Sciences, Chengdu, China (GRID:grid.54549.39) (ISNI:0000 0004 0369 4060)
2 The University of Tokyo, Institute of Engineering Innovation, Tokyo, Japan (GRID:grid.26999.3d) (ISNI:0000 0001 2151 536X)
3 University of Electronic Science and Technology of China, School of Physics, Chengdu, China (GRID:grid.54549.39) (ISNI:0000 0004 0369 4060)
4 Nagoya University, Graduate School of Engineering, Nagoya, Japan (GRID:grid.27476.30) (ISNI:0000 0001 0943 978X); Nagoya University, Institute for Advanced Research, Nagoya, Japan (GRID:grid.27476.30) (ISNI:0000 0001 0943 978X)
5 Sun Yat‐sen University, School of Materials, Guangzhou, China (GRID:grid.12981.33) (ISNI:0000 0001 2360 039X)
6 Office of University Professors, The University of Tokyo, Tokyo, Japan (GRID:grid.26999.3d) (ISNI:0000 0001 2151 536X); Shinshu University, Research Initiative for Supra-Materials (RISM), Nagano, Japan (GRID:grid.263518.b) (ISNI:0000 0001 1507 4692)




