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Abstract
The quantum Hall (QH) effect in two-dimensional electron systems (2DESs) is conventionally observed at liquid-helium temperatures, where lattice vibrations are strongly suppressed and bulk carrier scattering is dominated by disorder. However, due to large Landau level (LL) separation (~2000 K at B = 30 T), graphene can support the QH effect up to room temperature (RT), concomitant with a non-negligible population of acoustic phonons with a wave-vector commensurate to the inverse electronic magnetic length. Here, we demonstrate that graphene encapsulated in hexagonal boron nitride (hBN) realizes a novel transport regime, where dissipation in the QH phase is governed predominantly by electron-phonon scattering. Investigating thermally-activated transport at filling factor 2 up to RT in an ensemble of back-gated devices, we show that the high B-field behaviour correlates with their zero B-field transport mobility. By this means, we extend the well-accepted notion of phonon-limited resistivity in ultra-clean graphene to a hitherto unexplored high-field realm.
Monolayer graphene can support the quantum Hall effect up to room temperature. Here, the authors provide evidence that graphene encapsulated in hexagonal boron nitride realizes a novel transport regime where dissipation in the quantum Hall phase is mediated predominantly by electron-phonon scattering rather than disorder scattering.
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1 Universidad de Salamanca, Nanotechnology Group, USAL–Nanolab, Salamanca, Spain (GRID:grid.11762.33) (ISNI:0000 0001 2180 1817)
2 RWTH Aachen University, JARA-FIT and 2nd Institute of Physics, Aachen, Germany (GRID:grid.1957.a) (ISNI:0000 0001 0728 696X); Forschungszentrum Jülich, Peter Grünberg Institute (PGI-9), Jülich, Germany (GRID:grid.8385.6) (ISNI:0000 0001 2297 375X)
3 Universidad de Salamanca, Nanotechnology Group, USAL–Nanolab, Salamanca, Spain (GRID:grid.11762.33) (ISNI:0000 0001 2180 1817); Polish Academy of Sciences, CENTERA Laboratories, Institute of High Pressure Physics, Warsaw, Poland (GRID:grid.413454.3) (ISNI:0000 0001 1958 0162)
4 Radboud University, High Field Magnet Laboratory (HFML-EMFL), Nijmegen, The Netherlands (GRID:grid.5590.9) (ISNI:0000000122931605); Radboud University, Institute for Molecules and Materials, Nijmegen, The Netherlands (GRID:grid.5590.9) (ISNI:0000000122931605)
5 National Institute for Materials Science, Research Center for Functional Materials, Ibaraki, Japan (GRID:grid.21941.3f) (ISNI:0000 0001 0789 6880)
6 National Institute for Materials Science, International Center for Materials Nanoarchitectonics, Ibaraki, Japan (GRID:grid.21941.3f) (ISNI:0000 0001 0789 6880)
7 RWTH Aachen University, JARA-FIT and 2nd Institute of Physics, Aachen, Germany (GRID:grid.1957.a) (ISNI:0000 0001 0728 696X)
8 Radboud University, Institute for Molecules and Materials, Nijmegen, The Netherlands (GRID:grid.5590.9) (ISNI:0000000122931605)
9 NEST, Istituto Nanoscienze-CNR and Scuola Normale Superiore, Pisa, Italy (GRID:grid.509494.5)