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Abstract
The use of an identical electrolyte in electrochemical metallization (ECM)-based neuron and synaptic devices has not yet been achieved due to their different resistive-switching characteristics. Herein, we describe ECM devices comprising the same ferroelectric PbZr0.52Ti0.48O3 (PZT) electrolyte, which can sustain both neuron and synaptic behavior depending on the identity of the active electrode. The Ag/PZT/La0.8Sr0.2MnO3 (LSMO) threshold switching memristor shows abrupt and volatile resistive switching characteristics, which lead to neuron devices with stochastic integration-and-fire behavior, auto-recovery, and rapid operation. In contrast, the Ni/PZT/LSMO memory switching memristor exhibits gradual, non-volatile resistive switching behavior, which leads to synaptic devices with a high on/off ratio, low on-state current, low variability, and spike-timing-dependent plasticity (STDP). The divergent behavior of the ECM devices is attributed to greater control of cation migration through the ultrathin ferroelectric PZT. Thus, ECM devices with an identical ferroelectric electrolyte offer promise as essential building blocks in the construction of high-performance neuromorphic computing systems.
The use of an identical electrolyte in electrochemical metallization (ECM)-based neuron and synaptic devices has not yet been achieved. We demonstrate ECM devices containing the same ferroelectric PbZr0.52Ti0.48O3 (PZT) electrolyte, which can sustain both neuron and synaptic behavior depending on the active electrode. The Ag/PZT/La0.8Sr0.2MnO3 (LSMO) threshold switching memristor exhibits abrupt and volatile resistive switching characteristics, resulting in neuron devices. In contrast, the Ni/PZT/LSMO memory switching memristor displays gradual, non-volatile resistive switching behavior which leads to synaptic devices. The divergent behavior of the ECM devices is attributed to greater control of cation migration through the ultrathin ferroelectric PZT.
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1 Konkuk University, Division of Quantum Phases & Devices, Department of Physics, Seoul, Republic of Korea (GRID:grid.258676.8) (ISNI:0000 0004 0532 8339)
2 Institute of Basic Science (IBS), Center for Correlated Electron Systems (CCES), Seoul, Republic of Korea (GRID:grid.410720.0) (ISNI:0000 0004 1784 4496); Seoul National University, Department of Physics and Astronomy, Seoul, Republic of Korea (GRID:grid.31501.36) (ISNI:0000 0004 0470 5905)
3 Chungnam National University, Graduate School of Analytical Science and Technology, Daejoen, Republic of Korea (GRID:grid.254230.2) (ISNI:0000 0001 0722 6377)