It appears you don't have support to open PDFs in this web browser. To view this file, Open with your PDF reader
Abstract
High quality(Q) factor optical resonators are indispensable for many photonic devices. While very large Q-factors can be obtained theoretically in guided-mode settings, free-space implementations suffer from various limitations on the narrowest linewidth in real experiments. Here, we propose a simple strategy to enable ultrahigh-Q guided-mode resonances by introducing a patterned perturbation layer on top of a multilayer-waveguide system. We demonstrate that the associated Q-factors are inversely proportional to the perturbation squared while the resonant wavelength can be tuned through material or structural parameters. We experimentally demonstrate such high-Q resonances at telecom wavelengths by patterning a low-index layer on top of a 220 nm silicon on insulator substrate. The measurements show Q-factors up to 2.39 × 105, comparable to the largest Q-factor obtained by topological engineering, while the resonant wavelength is tuned by varying the lattice constant of the top perturbation layer. Our results hold great promise for exciting applications like sensors and filters.
The authors report a simple strategy to enable ultrahigh-Q guided-mode resonances by introducing a patterned perturbation layer on top of a multilayer-waveguide system. Such high-Q resonances are experimentally demonstrated with measured Q-factors up to 2.4 × 105.
You have requested "on-the-fly" machine translation of selected content from our databases. This functionality is provided solely for your convenience and is in no way intended to replace human translation. Show full disclaimer
Neither ProQuest nor its licensors make any representations or warranties with respect to the translations. The translations are automatically generated "AS IS" and "AS AVAILABLE" and are not retained in our systems. PROQUEST AND ITS LICENSORS SPECIFICALLY DISCLAIM ANY AND ALL EXPRESS OR IMPLIED WARRANTIES, INCLUDING WITHOUT LIMITATION, ANY WARRANTIES FOR AVAILABILITY, ACCURACY, TIMELINESS, COMPLETENESS, NON-INFRINGMENT, MERCHANTABILITY OR FITNESS FOR A PARTICULAR PURPOSE. Your use of the translations is subject to all use restrictions contained in your Electronic Products License Agreement and by using the translation functionality you agree to forgo any and all claims against ProQuest or its licensors for your use of the translation functionality and any output derived there from. Hide full disclaimer
Details





1 University of New South Wales, School of Engineering and Information Technology, Canberra, Australia (GRID:grid.1005.4) (ISNI:0000 0004 4902 0432)
2 Chinese Academy of Sciences, State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Shanghai, China (GRID:grid.9227.e) (ISNI:0000000119573309); University of Chinese Academy of Sciences, Hangzhou Institute for Advanced Study, Hangzhou, China (GRID:grid.410726.6) (ISNI:0000 0004 1797 8419); Shanghai Research Center for Quantum Sciences, Shanghai, China (GRID:grid.9227.e) (ISNI:0000000119573309)
3 Guizhou Minzu University, School of Physics and Mechatronic Engineering, Guiyang, China (GRID:grid.443389.1) (ISNI:0000 0000 9477 4541)
4 Nottingham Trent University, Advanced Optics and Photonics Laboratory, Department of Engineering, School of Science Technology, Nottingham, UK (GRID:grid.12361.37) (ISNI:0000 0001 0727 0669)
5 City University of New York, Photonics Initiative, Advanced Science Research Center, New York, USA (GRID:grid.212340.6) (ISNI:0000000122985718)
6 City University of New York, Photonics Initiative, Advanced Science Research Center, New York, USA (GRID:grid.212340.6) (ISNI:0000000122985718); City University of New York, Physics Program, Graduate Center, New York, USA (GRID:grid.212340.6) (ISNI:0000000122985718)