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Abstract
Van der Waals dielectrics are fundamental materials for condensed matter physics and advanced electronic applications. Most dielectrics host isotropic structures in crystalline or amorphous forms, and only a few studies have considered the role of anisotropic crystal symmetry in dielectrics as a delicate way to tune electronic properties of channel materials. Here, we demonstrate a layered anisotropic dielectric, SiP2, with non-symmorphic twofold-rotational C2 symmetry as a gate medium which can break the original threefold-rotational C3 symmetry of MoS2 to achieve unexpected linearly-polarized photoluminescence and anisotropic second harmonic generation at SiP2/MoS2 interfaces. In contrast to the isotropic behavior of pristine MoS2, a large conductance anisotropy with an anisotropy index up to 1000 can be achieved and modulated in SiP2-gated MoS2 transistors. Theoretical calculations reveal that the anisotropic moiré potential at such interfaces is responsible for the giant anisotropic conductance and optical response. Our results provide a strategy for generating exotic functionalities at dielectric/semiconductor interfaces via symmetry engineering.
Here, the authors demonstrate that a layered anisotropic dielectric material, SiP2, can break the rotational symmetry of 2D MoS2, leading to linearly polarized photoluminescence emission and conductance anisotropy ratios up to 1000 in gated SiP2/MoS2 heterostructures.
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1 Nanjing University, National Laboratory of Solid State Microstructures, and Collaborative Innovation Center of Advanced Microstructures, Nanjing, China (GRID:grid.41156.37) (ISNI:0000 0001 2314 964X); Nanjing University, College of Engineering and Applied Sciences, and Jiangsu Key Laboratory of Artificial Functional Materials, Nanjing, China (GRID:grid.41156.37) (ISNI:0000 0001 2314 964X)
2 School of Materials Science and Engineering, Beihang University, Beijing, China (GRID:grid.64939.31) (ISNI:0000 0000 9999 1211)
3 Nanjing University, National Laboratory of Solid State Microstructures, and Collaborative Innovation Center of Advanced Microstructures, Nanjing, China (GRID:grid.41156.37) (ISNI:0000 0001 2314 964X); Nanjing University, School of Physics, Nanjing, China (GRID:grid.41156.37) (ISNI:0000 0001 2314 964X)
4 Chongqing University, College of Materials Sciences and Engineering, National Engineering Research Center for Magnesium Alloys, Chongqing, China (GRID:grid.190737.b) (ISNI:0000 0001 0154 0904)
5 Center for High Pressure Science and Technology Advanced Research, Beijing, China (GRID:grid.503238.f) (ISNI:0000 0004 7423 8214)
6 The University of Tokyo, Quantum Phase Electronic Center and Department of Applied Physics, Tokyo, Japan (GRID:grid.26999.3d) (ISNI:0000 0001 2151 536X); The University of Tokyo, Institute for Solid State Physics, Chiba, Japan (GRID:grid.26999.3d) (ISNI:0000 0001 2151 536X)
7 School of Materials Science and Engineering, Beihang University, Beijing, China (GRID:grid.64939.31) (ISNI:0000 0000 9999 1211); Center for Free Electron Laser Science, Max Planck Institute for the Structure and Dynamics of Matter, Hamburg, Germany (GRID:grid.466493.a) (ISNI:0000 0004 0390 1787)
8 The University of Tokyo, Quantum Phase Electronic Center and Department of Applied Physics, Tokyo, Japan (GRID:grid.26999.3d) (ISNI:0000 0001 2151 536X); RIKEN Center for Emergent Matter Science, Wako, Japan (GRID:grid.474689.0)