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Abstract
We investigate the voltage control of magnetism in a van der Waals (vdW) heterostructure device consisting of two distinct vdW materials, the ferromagnetic Fe3-xGeTe2 and the ferroelectric In2Se3. It is observed that gate voltages applied to the Fe3-xGeTe2/In2Se3 heterostructure device modulate the magnetic properties of Fe3-xGeTe2 with significant decrease in coercive field for both positive and negative voltages. Raman spectroscopy on the heterostructure device shows voltage-dependent increase in the in-plane In2Se3 and Fe3-xGeTe2 lattice constants for both voltage polarities. Thus, the voltage-dependent decrease in the Fe3-xGeTe2 coercive field, regardless of the gate voltage polarity, can be attributed to the presence of in-plane tensile strain. This is supported by density functional theory calculations showing tensile-strain-induced reduction of the magnetocrystalline anisotropy, which in turn decreases the coercive field. Our results demonstrate an effective method to realize low-power voltage-controlled vdW spintronic devices utilizing the magnetoelectric effect in vdW ferromagnetic/ferroelectric heterostructures.
The control of magnetism by electric field is an important goal for future development of low-power spintronics. Here, the authors demonstrate voltage control of magnetism in van der Waals ferromagnetic/ferroelectric heterostructure devices via the strain-mediated magnetoelectric effect.
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1 Korea Institute of Science and Technology (KIST), Center for Spintronics, Seoul, Korea (GRID:grid.496416.8) (ISNI:0000 0004 5934 6655); Seoul National University, Department of Physics and Astronomy, Seoul, Korea (GRID:grid.31501.36) (ISNI:0000 0004 0470 5905)
2 Korea Institute of Science and Technology (KIST), Center for Spintronics, Seoul, Korea (GRID:grid.496416.8) (ISNI:0000 0004 5934 6655)
3 Korea Institute of Science and Technology (KIST), Center for Spintronics, Seoul, Korea (GRID:grid.496416.8) (ISNI:0000 0004 5934 6655); Soongsil University, Department of Physics, Seoul, Korea (GRID:grid.263765.3) (ISNI:0000 0004 0533 3568)
4 Kyung Hee University, Department of Physics and Department of Information Display, Seoul, Korea (GRID:grid.289247.2) (ISNI:0000 0001 2171 7818)
5 KAIST, Department of Physics, Daejeon, Korea (GRID:grid.37172.30) (ISNI:0000 0001 2292 0500)
6 Korea Institute of Science and Technology (KIST), Advanced Analysis Center, Seoul, Republic of Korea (GRID:grid.496416.8) (ISNI:0000 0004 5934 6655)
7 Korea Institute of Science and Technology (KIST), Electronic Materials Research Center, Seoul, Korea (GRID:grid.496416.8) (ISNI:0000 0004 5934 6655)
8 Chung-Ang University, Department of Physics, Seoul, Korea (GRID:grid.254224.7) (ISNI:0000 0001 0789 9563)
9 Brookhaven National Laboratory, Condensed Matter Physics and Materials Science Department, Upton, USA (GRID:grid.202665.5) (ISNI:0000 0001 2188 4229); Stony Brook University, Department of Physics and Astronomy, Stony Brook, USA (GRID:grid.36425.36) (ISNI:0000 0001 2216 9681)
10 Soongsil University, Department of Physics, Seoul, Korea (GRID:grid.263765.3) (ISNI:0000 0004 0533 3568); Soongsil University, Origin of Matter and Evolution of Galaxies (OMEG) Institute, Seoul, Korea (GRID:grid.263765.3) (ISNI:0000 0004 0533 3568)