Abstract

We investigate the voltage control of magnetism in a van der Waals (vdW) heterostructure device consisting of two distinct vdW materials, the ferromagnetic Fe3-xGeTe2 and the ferroelectric In2Se3. It is observed that gate voltages applied to the Fe3-xGeTe2/In2Se3 heterostructure device modulate the magnetic properties of Fe3-xGeTe2 with significant decrease in coercive field for both positive and negative voltages. Raman spectroscopy on the heterostructure device shows voltage-dependent increase in the in-plane In2Se3 and Fe3-xGeTe2 lattice constants for both voltage polarities. Thus, the voltage-dependent decrease in the Fe3-xGeTe2 coercive field, regardless of the gate voltage polarity, can be attributed to the presence of in-plane tensile strain. This is supported by density functional theory calculations showing tensile-strain-induced reduction of the magnetocrystalline anisotropy, which in turn decreases the coercive field. Our results demonstrate an effective method to realize low-power voltage-controlled vdW spintronic devices utilizing the magnetoelectric effect in vdW ferromagnetic/ferroelectric heterostructures.

The control of magnetism by electric field is an important goal for future development of low-power spintronics. Here, the authors demonstrate voltage control of magnetism in van der Waals ferromagnetic/ferroelectric heterostructure devices via the strain-mediated magnetoelectric effect.

Details

Title
Voltage control of magnetism in Fe3-xGeTe2/In2Se3 van der Waals ferromagnetic/ferroelectric heterostructures
Author
Eom, Jaeun 1   VIAFID ORCID Logo  ; Lee, In Hak 2 ; Kee, Jung Yun 3 ; Cho, Minhyun 4 ; Seo, Jeongdae 5 ; Suh, Hoyoung 6 ; Choi, Hyung-Jin 7 ; Sim, Yumin 8 ; Chen, Shuzhang 9 ; Chang, Hye Jung 6   VIAFID ORCID Logo  ; Baek, Seung-Hyub 7 ; Petrovic, Cedomir 9   VIAFID ORCID Logo  ; Ryu, Hyejin 2   VIAFID ORCID Logo  ; Jang, Chaun 2 ; Kim, Young Duck 4   VIAFID ORCID Logo  ; Yang, Chan-Ho 5   VIAFID ORCID Logo  ; Seong, Maeng-Je 8   VIAFID ORCID Logo  ; Lee, Jin Hong 2   VIAFID ORCID Logo  ; Park, Se Young 10   VIAFID ORCID Logo  ; Choi, Jun Woo 2   VIAFID ORCID Logo 

 Korea Institute of Science and Technology (KIST), Center for Spintronics, Seoul, Korea (GRID:grid.496416.8) (ISNI:0000 0004 5934 6655); Seoul National University, Department of Physics and Astronomy, Seoul, Korea (GRID:grid.31501.36) (ISNI:0000 0004 0470 5905) 
 Korea Institute of Science and Technology (KIST), Center for Spintronics, Seoul, Korea (GRID:grid.496416.8) (ISNI:0000 0004 5934 6655) 
 Korea Institute of Science and Technology (KIST), Center for Spintronics, Seoul, Korea (GRID:grid.496416.8) (ISNI:0000 0004 5934 6655); Soongsil University, Department of Physics, Seoul, Korea (GRID:grid.263765.3) (ISNI:0000 0004 0533 3568) 
 Kyung Hee University, Department of Physics and Department of Information Display, Seoul, Korea (GRID:grid.289247.2) (ISNI:0000 0001 2171 7818) 
 KAIST, Department of Physics, Daejeon, Korea (GRID:grid.37172.30) (ISNI:0000 0001 2292 0500) 
 Korea Institute of Science and Technology (KIST), Advanced Analysis Center, Seoul, Republic of Korea (GRID:grid.496416.8) (ISNI:0000 0004 5934 6655) 
 Korea Institute of Science and Technology (KIST), Electronic Materials Research Center, Seoul, Korea (GRID:grid.496416.8) (ISNI:0000 0004 5934 6655) 
 Chung-Ang University, Department of Physics, Seoul, Korea (GRID:grid.254224.7) (ISNI:0000 0001 0789 9563) 
 Brookhaven National Laboratory, Condensed Matter Physics and Materials Science Department, Upton, USA (GRID:grid.202665.5) (ISNI:0000 0001 2188 4229); Stony Brook University, Department of Physics and Astronomy, Stony Brook, USA (GRID:grid.36425.36) (ISNI:0000 0001 2216 9681) 
10  Soongsil University, Department of Physics, Seoul, Korea (GRID:grid.263765.3) (ISNI:0000 0004 0533 3568); Soongsil University, Origin of Matter and Evolution of Galaxies (OMEG) Institute, Seoul, Korea (GRID:grid.263765.3) (ISNI:0000 0004 0533 3568) 
Pages
5605
Publication year
2023
Publication date
2023
Publisher
Nature Publishing Group
e-ISSN
20411723
Source type
Scholarly Journal
Language of publication
English
ProQuest document ID
2864014228
Copyright
© The Author(s) 2023. This work is published under http://creativecommons.org/licenses/by/4.0/ (the “License”). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.