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Abstract
Exceptional point (EP) is a special degeneracy of non-Hermitian systems. One-dimensional transmission systems operating at EPs are widely studied and applied to chiral conversion and sensing. Lately, two-dimensional systems at EPs have been exploited for their exotic scattering features, yet so far been limited to only the non-visible waveband. Here, we report a universal paradigm for achieving a high-efficiency EP in the visible by leveraging interlayer loss to accurately control the interplay between the lossy structure and scattering lightwaves. A bilayer framework is demonstrated to reflect back the incident light from the left side ( | r−1 | >0.999) and absorb the incident light from the right side ( | r+1 | < 10–4). As a proof of concept, a bilayer metasurface is demonstrated to reflect and absorb the incident light with experimental efficiencies of 88% and 85%, respectively, at 532 nm. Our results open the way for a new class of nanoscale devices and power up new opportunities for EP physics.
We report a universal paradigm for achieving a high-efficiency EP in the visible by leveraging interlayer loss to accurately control the interplay between the lossy structure and lightwaves.
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1 MOE Key Laboratory of Advanced Micro-Structured Materials, Shanghai, China; Tongji University, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Shanghai, China (GRID:grid.24516.34) (ISNI:0000 0001 2370 4535); Tongji University, Shanghai Institute of Intelligent Science and Technology, Shanghai, China (GRID:grid.24516.34) (ISNI:0000 0001 2370 4535); Shanghai Frontiers Science Center of Digital Optics, Shanghai, China (GRID:grid.24516.34); Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Shanghai, China (GRID:grid.24516.34); Tongji University, Department of Electronic Science and Technology, Shanghai, China (GRID:grid.24516.34) (ISNI:0000 0001 2370 4535)
2 MOE Key Laboratory of Advanced Micro-Structured Materials, Shanghai, China (GRID:grid.24516.34); Tongji University, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Shanghai, China (GRID:grid.24516.34) (ISNI:0000 0001 2370 4535); Tongji University, Shanghai Institute of Intelligent Science and Technology, Shanghai, China (GRID:grid.24516.34) (ISNI:0000 0001 2370 4535); Shanghai Frontiers Science Center of Digital Optics, Shanghai, China (GRID:grid.24516.34); Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Shanghai, China (GRID:grid.24516.34)
3 National University of Singapore, Department of Electrical and Computer Engineering, Singapore, Singapore (GRID:grid.4280.e) (ISNI:0000 0001 2180 6431)
4 MOE Key Laboratory of Advanced Micro-Structured Materials, Shanghai, China (GRID:grid.4280.e); Tongji University, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Shanghai, China (GRID:grid.24516.34) (ISNI:0000 0001 2370 4535); Tongji University, Shanghai Institute of Intelligent Science and Technology, Shanghai, China (GRID:grid.24516.34) (ISNI:0000 0001 2370 4535); Shanghai Frontiers Science Center of Digital Optics, Shanghai, China (GRID:grid.24516.34); Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Shanghai, China (GRID:grid.24516.34)
5 Tongji University, Institute of Acoustics, School of Physics Science and Engineering, Shanghai, China (GRID:grid.24516.34) (ISNI:0000000123704535)