Abstract

Protected surface states arising from non-trivial bandstructure topology in semimetals can potentially enable advanced device functionalities in compute, memory, interconnect, sensing, and communication. This necessitates a fundamental understanding of surface-state transport in nanoscale topological semimetals. Here, we investigate quantum transport in a prototypical topological semimetal NbAs to evaluate the potential of this class of materials for beyond-Cu interconnects in highly-scaled integrated circuits. Using density functional theory (DFT) coupled with non-equilibrium Green’s function (NEGF) calculations, we show that the resistance-area RA product in NbAs films decreases with decreasing thickness at the nanometer scale, in contrast to a nearly constant RA product in ideal Cu films. This anomalous scaling originates from the disproportionately large number of surface conduction states which dominate the ballistic conductance by up to 70% in NbAs thin films. We also show that this favorable RA scaling persists even in the presence of surface defects, in contrast to RA sharply increasing with reducing thickness for films of conventional metals, such as Cu, in the presence of surface defects. These results underscore the potential of topological semimetals as future back-end-of-line (BEOL) interconnect metals.

Details

Title
Surface-dominated conductance scaling in Weyl semimetal NbAs
Author
Kumar, Sushant 1   VIAFID ORCID Logo  ; Tu, Yi-Hsin 2 ; Luo, Sheng 3   VIAFID ORCID Logo  ; Lanzillo, Nicholas A. 4 ; Chang, Tay-Rong 2   VIAFID ORCID Logo  ; Liang, Gengchiau 3 ; Sundararaman, Ravishankar 5   VIAFID ORCID Logo  ; Lin, Hsin 6   VIAFID ORCID Logo  ; Chen, Ching-Tzu 7 

 Rensselaer Polytechnic Institute, Department of Materials Science & Engineering, Troy, USA (GRID:grid.33647.35) (ISNI:0000 0001 2160 9198); IBM Thomas J. Watson Research Center, Yorktown Heights, USA (GRID:grid.481554.9) (ISNI:0000 0001 2111 841X) 
 Cheng Kung University, Department of Physics, Tainan City, Taipei (GRID:grid.461191.a) (ISNI:0000 0004 1784 4904) 
 National University of Singapore, Department of Electrical and Computer Engineering, College of Design and Engineering, Singapore, Singapore (GRID:grid.4280.e) (ISNI:0000 0001 2180 6431) 
 IBM Research, Albany, USA (GRID:grid.481554.9) (ISNI:0000 0001 2111 841X) 
 Rensselaer Polytechnic Institute, Department of Materials Science & Engineering, Troy, USA (GRID:grid.33647.35) (ISNI:0000 0001 2160 9198) 
 Academia Sinica, Institute of Physics, Taipei, Taipei (GRID:grid.28665.3f) (ISNI:0000 0001 2287 1366) 
 IBM Thomas J. Watson Research Center, Yorktown Heights, USA (GRID:grid.481554.9) (ISNI:0000 0001 2111 841X) 
Pages
84
Publication year
2024
Publication date
2024
Publisher
Nature Publishing Group
e-ISSN
20573960
Source type
Scholarly Journal
Language of publication
English
ProQuest document ID
3049548777
Copyright
© The Author(s) 2024. This work is published under http://creativecommons.org/licenses/by/4.0/ (the “License”). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.