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Abstract
Epitaxial growth of two-dimensional (2D) materials with uniform orientation has been previously realized by introducing a small binding energy difference between the two locally most stable orientations. However, this small energy difference can be easily disturbed by uncontrollable dynamics during the growth process, limiting its practical applications. Herein, we propose a quasi-equilibrium growth (QEG) strategy to synthesize inch-scale monolayer α-In2Se3 single crystals, a semiconductor with ferroelectric properties, on fluor-phlogopite substrates. The QEG facilitates the discrimination of small differences in binding energy between the two locally most stable orientations, realizing robust single-orientation epitaxy within a broad growth window. Thus, single-crystal α-In2Se3 film can be epitaxially grown on fluor-phlogopite, the cleavage surface atomic layer of which has the same 3-fold rotational symmetry with α-In2Se3. The resulting crystalline quality enables high electron mobility up to 117.2 cm2 V−1 s−1 in α-In2Se3 ferroelectric field-effect transistors, exhibiting reliable nonvolatile memory performance with long retention time and robust cycling endurance. In brief, the developed QEG method provides a route for preparing larger-area single-crystal 2D materials and a promising opportunity for applications of 2D ferroelectric devices and nanoelectronics.
The controlled growth of large-area single-crystalline 2D semiconductors remains a significant challenge for their electronic applications. Here, the authors report a quasi-equilibrium growth method to synthesize inch-scale monolayer α-In2Se3 with high mobility and ferroelectric field-effect transistor performance.
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1 Beihang University, School of Materials Science and Engineering, Beijing, P. R. China (GRID:grid.64939.31) (ISNI:0000 0000 9999 1211)
2 Chinese Academy of Sciences, Institute of Technology for Carbon Neutrality, Shenzhen Institute of Advanced Technology, Shenzhen, China (GRID:grid.9227.e) (ISNI:0000000119573309); Shenzhen University of Advanced Technology, Faculty of Materials Science and Energy Engineer, Shenzhen, China (GRID:grid.263488.3) (ISNI:0000 0001 0472 9649)
3 Beihang University, School of Materials Science and Engineering, Beijing, P. R. China (GRID:grid.64939.31) (ISNI:0000 0000 9999 1211); Beihang University, The Analysis & Testing Center, Beijing, P. R. China (GRID:grid.64939.31) (ISNI:0000 0000 9999 1211)
4 East China Normal University, Technical Center for Multifunctional Magneto Optical Spectroscopy (Shanghai), Department of Physics, School of Physics and Electronic Science, Shanghai, P. R. China (GRID:grid.22069.3f) (ISNI:0000 0004 0369 6365)
5 Beihang University, School of Materials Science and Engineering, Beijing, P. R. China (GRID:grid.64939.31) (ISNI:0000 0000 9999 1211); Max Planck Institute for the Structure and Dynamics of Matter, Center for Free-Electron Laser Science, Hamburg, Germany (GRID:grid.469852.4) (ISNI:0000 0004 1796 3508)
6 Beihang University, School of Materials Science and Engineering, Beijing, P. R. China (GRID:grid.64939.31) (ISNI:0000 0000 9999 1211); Tianmushan Laboratory Xixi Octagon City, Hangzhou, P. R. China (GRID:grid.64939.31); Center for Micro-Nano Innovation of Beihang University, Beijing, P. R. China (GRID:grid.64939.31) (ISNI:0000 0000 9999 1211)