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Contact Resistance Optimization in MoS\({_2}\) Field-Effect Transistors through Reverse Sputtering-Induced Structural Modifications
Yuan Fa; Piacentini, Agata; Macco, Bart; Kalisch, Holger; Heuken, Michael; et al. arXiv.org, Dec 9, 2024.You might have access to this document
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