- Preview Available
- Scholarly Journal
Conduction Mechanism and Improved Endurance in HfO2-Based RRAM with Nitridation Treatment
Nanoscale Research Letters; Heidelberg Vol. 12, Iss. 1, (Dec 2017): 574.
DOI:10.1186/s11671-017-2330-3
This is a limited preview of the full PDF
Try and log in through your library or institution to see if they have access.