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© The Author(s) 2025. This work is published under http://creativecommons.org/licenses/by/4.0/ (the “License”). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.

Abstract

Dielectric metasurfaces that combine high-index materials with optical nonlinearities are recognized for their potential in quantum and classical nanophotonic applications. However, the fabrication of high-quality metasurfaces poses material-dependent challenges, as their designs are often susceptible to disorder, defects, and scattering losses, mostly occurring at the edges of nanostructured features. Additionally, the choice of the material platforms featuring second-order optical nonlinearities χ(2), is limited to broken-inversion symmetry crystals such as GaAs, GaP, LiNbO3, and various bulk van der Waals materials. Here, we use a combination of top-down lithography and anisotropic wet etching of a specially stacked van der Waals crystal – 3R-MoS2, which exhibits both a high refractive index and exceptional χ(2) nonlinearity, to produce ultrathin (~20–25 nm) metasurfaces with atomically sharp edges, where the etching breaks the in-plane symmetry of the meta-atoms. The broken symmetry manifests as a quasi-boundstate-in-the-continuum, enabling the enhancement of second-harmonic generation of three orders of magnitude at specific wavelengths.

Dielectric metasurfaces with strong nonlinearities hold promise for integrated nanophotonics and quantum technologies, yet their fabrication is hindered by material-dependent challenges and limited material choices with second-order optical nonlinearities. Here, the authors employ top-down lithography and anisotropic wet etching to fabricate atomically precise, ultrathin metasurfaces highly efficient for second-harmonic generation.

Details

Title
Ultrathin 3R-MoS2 metasurfaces with atomically precise edges for efficient nonlinear nanophotonics
Author
Zograf, George 1   VIAFID ORCID Logo  ; Küçüköz, Betül 1   VIAFID ORCID Logo  ; Polyakov, Alexander Yu. 1   VIAFID ORCID Logo  ; Yankovich, Andrew B. 1   VIAFID ORCID Logo  ; Ranjan, Alok 1   VIAFID ORCID Logo  ; Bancerek, Maria 2   VIAFID ORCID Logo  ; Agrawal, Abhay V. 1 ; Olsson, Eva 1   VIAFID ORCID Logo  ; Wieczorek, Witlef 3   VIAFID ORCID Logo  ; Antosiewicz, Tomasz J. 4   VIAFID ORCID Logo  ; Shegai, Timur O. 1   VIAFID ORCID Logo 

 Chalmers University of Technology, Department of Physics, Göteborg, Sweden (GRID:grid.5371.0) (ISNI:0000 0001 0775 6028) 
 University of Warsaw, Faculty of Physics, Warsaw, Poland (GRID:grid.12847.38) (ISNI:0000 0004 1937 1290) 
 Chalmers University of Technology, Department of Microtechnology and Nanoscience, Göteborg, Sweden (GRID:grid.5371.0) (ISNI:0000 0001 0775 6028) 
 Chalmers University of Technology, Department of Physics, Göteborg, Sweden (GRID:grid.5371.0) (ISNI:0000 0001 0775 6028); University of Warsaw, Faculty of Physics, Warsaw, Poland (GRID:grid.12847.38) (ISNI:0000 0004 1937 1290) 
Pages
271
Publication year
2025
Publication date
2025
Publisher
Nature Publishing Group
e-ISSN
23993650
Source type
Scholarly Journal
Language of publication
English
ProQuest document ID
3226589300
Copyright
© The Author(s) 2025. This work is published under http://creativecommons.org/licenses/by/4.0/ (the “License”). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.