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© 2022 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.

Abstract

In this study, we present results of a detailed topological analysis of electron density (ED) of 145 halogen-bonded complexes formed by various fluorine-, chlorine-, bromine-, and iodine-containing compounds with trimethylphosphine oxide, Me3PO. To characterize the halogen bond (XB) strength, we used the complexation enthalpy, the interatomic distance between oxygen and halogen, as well as the typical set of electron density properties at the bond critical points calculated at B3LYP/jorge-ATZP level of theory. We show for the first time that it is possible to predict the XB strength based on the distance between the minima of ED and molecular electrostatic potential (ESP) along the XB path. The gap between ED and ESP minima exponentially depends on local electronic kinetic energy density at the bond critical point and tends to be a common limiting value for the strongest halogen bond.

Details

Title
The Distance between Minima of Electron Density and Electrostatic Potential as a Measure of Halogen Bond Strength
Author
Chakalov, Edem R 1 ; Elena Yu Tupikina 1   VIAFID ORCID Logo  ; Ivanov, Daniil M 1 ; Bartashevich, Ekaterina V 2 ; Tolstoy, Peter M 1   VIAFID ORCID Logo 

 Institute of Chemistry, St. Petersburg State University, 198504 St. Petersburg, Russia; [email protected] (E.R.C.); [email protected] (E.Y.T.) 
 Chemistry Department, South Ural State University, 454080 Chelyabinsk, Russia; [email protected] 
First page
4848
Publication year
2022
Publication date
2022
Publisher
MDPI AG
e-ISSN
14203049
Source type
Scholarly Journal
Language of publication
English
ProQuest document ID
2700740295
Copyright
© 2022 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.