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Abstract
Small 15 µm unit-cell mid-wavelength infrared (MWIR) detectors have been fabricated and characterized at Raytheon Vision Systems (RVS) to enable the development of high resolution, large format, infrared imaging systems. The detectors are fabricated using molecular beam epitaxy (MBE) grown 4-in. HgCdTe-on-Si wafers with a p-on-n double layer heterojunction (DLHJ) device architecture. Advanced fabrication processes, such as inductively coupled plasma (ICP) etching, developed for large format MBE-on-Si wafers and 20 µm unit-cell two-color triple layer heterojunction (TLHJ) focal plane arrays (FPAs) have been successfully extended and applied to yield high performance 15 µm unit-cell single color detectors that compare favorably with state-of-the-art detectors with larger pitch. The measured 78 K MWIR cut-off wavelength for the fabricated detectors is near 5.5 µm, and the current-voltage characteristics of these devices exhibit strong reverse breakdown and RoA performance as a function of temperature with diffusion limited performance extending to temperatures down to 120 K. [PUBLICATION ABSTRACT]