Abstract

A small Be ion dose of 5 נ1014 cm−2 was implanted in a 2 μm thick GaN epilayer at an energy of 50 keV. The sample was characterized by high-resolution transmission electron microscopy (HRTEM) and Raman spectroscopy techniques after a post-implantation rapid thermal annealing (RTA) treatment. The HRTEM images show the crystallographic (1 1 0) and (0 0 2) planes of β-Be3N2. Two characteristic parallelograms drawn in Fast Fourier transform (FFT) image support the formation of β-Be3N2 nanocrystallites in RTA treated sample. Two Raman peaks at 168 and 199 cm−1 are observed in the Raman spectrum of the sample that are assigned to β-Be3N2 on the basis of group theory and HRTEM data. The Raman peak at 168 cm−1 is found close to the K point in the first Brillouin zone of β-Be3N2 while the peak at 199 cm−1 is assigned as a combination mode of the fundamental Raman modes of β-Be3N2.

Details

Title
Formation of β-Be3N2 nanocrystallites in Be-implanted GaN
Author
Peng, Yi 1 ; Muhammad Farooq Saleem 1 ; Wenwang Wei 1 ; Ji, Keyu 1 ; Guo, Qi 1 ; Yang, Yue 1 ; Chen, Jie 1 ; Zhang, Xuan 1 ; Wang, Yukun 1 ; Sun, Wenhong 2   VIAFID ORCID Logo 

 Research Center for Optoelectronic Materials and Devices, School of Physical Science & Technology, Guangxi University, 530004 Nanning, People’s Republic of China 
 Research Center for Optoelectronic Materials and Devices, School of Physical Science & Technology, Guangxi University, 530004 Nanning, People’s Republic of China; Guangxi Key Laboratory of Processing for Non-ferrous Metallic and Featured Materials, 530004 Nanning, People’s Republic of China 
Publication year
2021
Publication date
Mar 2021
Publisher
IOP Publishing
e-ISSN
20531591
Source type
Scholarly Journal
Language of publication
English
ProQuest document ID
2512956621
Copyright
© 2021. This work is published under http://creativecommons.org/licenses/by/4.0/ (the “License”). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.