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Low temperature deposition: Properties of SiO2 films from TEOS and ozone by APCVD system
Juárez, H; Pacio, M; Díaz, T; Rosendo, E; Garcia, G
; et al.
Journal of Physics: Conference Series; Bristol Vol. 167, Iss. 1, (May 2009).
DOI:10.1088/1742-6596/167/1/012020
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