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© 2022 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.

Abstract

We report the fabrication and optical characterization of Yb3+-doped waveguide amplifiers (YDWA) on the thin film lithium niobate fabricated by photolithography assisted chemo-mechanical etching. The fabricated Yb3+-doped lithium niobate waveguides demonstrates low propagation loss of 0.13 dB/cm at 1030 nm and 0.1 dB/cm at 1060 nm. The internal net gain of 5 dB at 1030 nm and 8 dB at 1060 nm are measured on a 4.0 cm long waveguide pumped by 976 nm laser diodes, indicating the gain per unit length of 1.25 dB/cm at 1030 nm and 2 dB/cm at 1060 nm, respectively. The integrated Yb3+-doped lithium niobate waveguide amplifiers will benefit the development of a powerful gain platform and are expected to contribute to the high-density integration of thin film lithium niobate based photonic chip.

Details

Title
On-Chip Integrated Yb3+-Doped Waveguide Amplifiers on Thin Film Lithium Niobate
Author
Zhang, Zhihao 1 ; Fang, Zhiwei 2 ; Zhou, Junxia 3 ; Liang, Youting 3 ; Zhou, Yuan 4 ; Wang, Zhe 1 ; Liu, Jian 2 ; Huang, Ting 2 ; Bao, Rui 3 ; Yu, Jianping 4 ; Zhang, Haisu 2 ; Wang, Min 2   VIAFID ORCID Logo  ; Cheng, Ya 5   VIAFID ORCID Logo 

 State Key Laboratory of High Field Laser Physics and CAS Center for Excellence in Ultra-Intense Laser Science, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai 201800, China; [email protected] (Z.Z.); [email protected] (Y.Z.); [email protected] (Z.W.); [email protected] (J.Y.); Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China; School of Physical Science and Technology, ShanghaiTech University, Shanghai 200031, China 
 The Extreme Optoelectromechanics Laboratory (XXL), School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China; [email protected] (J.Z.); [email protected] (Y.L.); [email protected] (J.L.); [email protected] (T.H.); [email protected] (R.B.); [email protected] (H.Z.); [email protected] (M.W.) 
 The Extreme Optoelectromechanics Laboratory (XXL), School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China; [email protected] (J.Z.); [email protected] (Y.L.); [email protected] (J.L.); [email protected] (T.H.); [email protected] (R.B.); [email protected] (H.Z.); [email protected] (M.W.); State Key Laboratory of Precision Spectroscopy, East China Normal University, Shanghai 200062, China 
 State Key Laboratory of High Field Laser Physics and CAS Center for Excellence in Ultra-Intense Laser Science, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai 201800, China; [email protected] (Z.Z.); [email protected] (Y.Z.); [email protected] (Z.W.); [email protected] (J.Y.); Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China 
 State Key Laboratory of High Field Laser Physics and CAS Center for Excellence in Ultra-Intense Laser Science, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai 201800, China; [email protected] (Z.Z.); [email protected] (Y.Z.); [email protected] (Z.W.); [email protected] (J.Y.); The Extreme Optoelectromechanics Laboratory (XXL), School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China; [email protected] (J.Z.); [email protected] (Y.L.); [email protected] (J.L.); [email protected] (T.H.); [email protected] (R.B.); [email protected] (H.Z.); [email protected] (M.W.); State Key Laboratory of Precision Spectroscopy, East China Normal University, Shanghai 200062, China; Collaborative Innovation Center of Extreme Optics, Shanxi University, Taiyuan 030006, China; Collaborative Innovation Center of Light Manipulations and Applications, Shandong Normal University, Jinan 250358, China; Shanghai Research Center for Quantum Sciences, Shanghai 201315, China 
First page
865
Publication year
2022
Publication date
2022
Publisher
MDPI AG
e-ISSN
2072666X
Source type
Scholarly Journal
Language of publication
English
ProQuest document ID
2679774057
Copyright
© 2022 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.