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Abstract
Metalenses are attractive alternatives to conventional bulky refractive lenses owing to their superior light-modulating performance and sub-micrometre-scale thicknesses; however, limitations in existing fabrication techniques, including high cost, low throughput and small patterning area, have hindered their mass production. Here we demonstrate low-cost and high-throughput mass production of large-aperture visible metalenses using deep-ultraviolet argon fluoride immersion lithography and wafer-scale nanoimprint lithography. Once a 12″ master stamp is imprinted, hundreds of centimetre-scale metalenses can be fabricated using a thinly coated high-index film to enhance light confinement, resulting in a substantial increase in conversion efficiency. As a proof of concept, an ultrathin virtual reality device created with the printed metalens demonstrates its potential towards the scalable manufacturing of metaphotonic devices.
The authors propose a method for the scalable manufacturing of metalenses using deep-ultraviolet argon fluoride immersion lithography and wafer-scale nanoimprint lithography, opening a route towards their low-cost, high-throughput mass production.
Details
; Seong, Junhwa 1 ; Kim, Wonjoong 2 ; Lee, Gun-Yeal 3 ; Kim, Seokwoo 1 ; Kim, Hongyoon 1 ; Moon, Seong-Won 1 ; Oh, Dong Kyo 1
; Yang, Younghwan 1
; Park, Jeonghoon 1
; Jang, Jaehyuck 4
; Kim, Yeseul 1 ; Jeong, Minsu 1 ; Park, Chanwoong 2 ; Choi, Hojung 2 ; Jeon, Gyoseon 5 ; Lee, Kyung-il 5 ; Yoon, Dong Hyun 5 ; Park, Namkyoo 3
; Lee, Byoungho 3
; Lee, Heon 2
; Rho, Junsuk 6
1 Pohang University of Science and Technology (POSTECH), Department of Mechanical Engineering, Pohang, Republic of Korea (GRID:grid.49100.3c) (ISNI:0000 0001 0742 4007)
2 Korea University, Department of Materials Science and Engineering, Seoul, Republic of Korea (GRID:grid.222754.4) (ISNI:0000 0001 0840 2678)
3 Seoul National University, School of Electrical and Computer Engineering, Seoul, Republic of Korea (GRID:grid.31501.36) (ISNI:0000 0004 0470 5905)
4 Pohang University of Science and Technology (POSTECH), Department of Chemical Engineering, Pohang, Republic of Korea (GRID:grid.49100.3c) (ISNI:0000 0001 0742 4007)
5 Research Institute of Industrial Science and Technology (RIST), Pohang, Republic of Korea (GRID:grid.464658.d) (ISNI:0000 0001 0604 2189)
6 Pohang University of Science and Technology (POSTECH), Department of Mechanical Engineering, Pohang, Republic of Korea (GRID:grid.49100.3c) (ISNI:0000 0001 0742 4007); Pohang University of Science and Technology (POSTECH), Department of Chemical Engineering, Pohang, Republic of Korea (GRID:grid.49100.3c) (ISNI:0000 0001 0742 4007); POSCO-POSTECH-RIST Convergence Research Center for Flat Optics and Metaphotonics, Pohang, Republic of Korea (GRID:grid.480377.f) (ISNI:0000 0000 9113 9200); National Institute of Nanomaterials Technology (NINT), Pohang, Republic of Korea (GRID:grid.49100.3c) (ISNI:0000 0001 0742 4007)





