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Abstract
Spectrally narrow optical resonances can be used to generate slow light, i.e., a large reduction in the group velocity. In a previous work, we developed hybrid 2D semiconductor plasmonic structures, which consist of propagating optical frequency surface-plasmon polaritons interacting with excitons in a semiconductor monolayer. Here, we use coupled exciton-surface plasmon polaritons (E-SPPs) in monolayer WSe2 to demonstrate slow light with a 1300 fold decrease of the SPP group velocity. Specifically, we use a high resolution two-color laser technique where the nonlinear E-SPP response gives rise to ultra-narrow coherent population oscillation (CPO) resonances, resulting in a group velocity on order of 105 m/s. Our work paves the way toward on-chip actively switched delay lines and optical buffers that utilize 2D semiconductors as active elements.
Slow light effects are interesting for telecommunications and quantum photonics applications. Here, the authors use coupled exciton-surface plasmon polaritons (SPPs) in a hybrid monolayer WSe2-metallic waveguide structure to demonstrate a 1300-fold reduction of the SPP group velocity.
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Details
; Watanabe, Kenji 6
; Schaibley, John R. 1
1 University of Arizona, Department of Physics, Tucson, USA (GRID:grid.134563.6) (ISNI:0000 0001 2168 186X)
2 University of Arizona, Department of Physics, Tucson, USA (GRID:grid.134563.6) (ISNI:0000 0001 2168 186X); University of Arizona, Wyant College of Optical Sciences, Tucson, USA (GRID:grid.134563.6) (ISNI:0000 0001 2168 186X)
3 University of Tennessee, Department of Materials Science and Engineering, Knoxville, USA (GRID:grid.411461.7) (ISNI:0000 0001 2315 1184)
4 University of Tennessee, Department of Materials Science and Engineering, Knoxville, USA (GRID:grid.411461.7) (ISNI:0000 0001 2315 1184); Oak Ridge National Laboratory, Materials Science and Technology Division, Oak Ridge, USA (GRID:grid.135519.a) (ISNI:0000 0004 0446 2659); University of Tennessee, Department of Physics and Astronomy, Knoxville, USA (GRID:grid.411461.7) (ISNI:0000 0001 2315 1184)
5 National Institute for Materials Science, International Center for Materials Nanoarchitectonics, Tsukuba, Japan (GRID:grid.21941.3f) (ISNI:0000 0001 0789 6880)
6 National Institute for Materials Science, Research Center for Functional Materials, Tsukuba, Japan (GRID:grid.21941.3f) (ISNI:0000 0001 0789 6880)




