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Supercritical carbon dioxide has reportedly been developed as an efficient photoresist stripping agent for semiconductor wafers by Air Products and Chemicals Inc., Allentown, Pa., and SC Fluids Inc., Nashua, N.H. Supercritical fluids act with the properties of both a liquid and a gas. In its supercritical state, CO acts as a powerful solvent that can be recycled and reused, unlike acids that have been the traditional choice to remove photoresist from semiconductors wafers. As part of the agreement, Air Products will install an SC Fluids supercritical COZ cleaning tool at its research and development facility in Allentown, Pa., to conduct research in support of new applications.