Lithographically defined cavities with high Quality and Purcell factors

Abstract

We introduce and analyze a lithographically defined cavity (Li-cavity) incorporating a buried mesa defect in a planar vertical structure, which induces transverse photonic confinement while enabling compatibility with electrical injection. We systematically investigate the influence of key cavity parameters on optical behavior and fundamental properties using a comprehensive three-dimensional optical model. Our analysis reveals that the Li-cavity exhibits low optical scattering, resulting in high Q and Purcell factors, even at sub-wavelength dimensions. Furthermore, the Li-cavity supports single-mode operation within a broader aperture size range compared to conventional cavity designs, promising enhanced optical power of single-mode emission. Adequately designed structures demonstrate superior Q and Purcell factors at wavelength-scale sizes, outperforming conventional micropillar cavities. These improved properties and customizable device characteristics stem from a simple fabrication process that precisely controls the cavity size, shape, and optical mode. Superior characteristics, along with its adaptability to diverse materials, wavelengths, and photonic integration platforms, promise a broad range of applications and potential adaptation of this design to diverse photonic devices.